(Read download) Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology)
♛ John E.J. Schmitz ♛
| #4559713 in Books | Noyes Publications | 1993-01-14 | Original language:English | PDF # 1 | 9.21 x.63 x6.14l,1.05 | File Name: 0815512880 | 251 pages |
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This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.
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